Zeiss Auriga 60
Configuration
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Operation Voltage:
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High Tension SEM: 200 V - 30 kV
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High Tension FIB: 0.2 kV - 30 kV
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Source
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FEG (Schottky)
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Gallium Liquid Metal Ion Source
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Imageing Detectors:
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In-lens SE, SESI, EsB, 4QBSD
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STEM detector
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Spectroscopy
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EDAX EDX detector
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Diffraction
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EDAX EBSD detector
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Gas Injection System (GIS)
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C, Pt, and Si
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XeF2 for selective etch enhancing
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Gas injection for charge compensation
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Manipulators
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Omniprobe 400 with independent x,y, z motion and rotation
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Transfer System
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High-vacuum transfer system compatible with glove box and UHV deposition system
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Resolution
30 kV | 15 kV | 1 kV | |
Electron Beam [nm] | 1.0 | 1.0 | 1.9 |
Gallium Ion Beam [nm] | 2.5 |
Imaging, Analysis and Sample Preparation Techniques
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SE & BSE SEM analysis
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STEM imaging
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EDX analysis
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EBSD analysis
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3D Slice & View tomography
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TEM sample preparation
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Nanoscale deposition and contacting